DocumentCode :
3292679
Title :
Fabrication and characterization of DLC-coated field emitter array
Author :
Ko, Chang Gi ; Ju, Byeong Kwon ; Lee, Yun Hi ; Park, Jung Ho ; Oh, Myung Hwan
Author_Institution :
Div. of Electron. & Inf. Technol., Korea Inst. of Sci. & Technol., Seoul, South Korea
fYear :
1996
fDate :
7-12 Jul 1996
Firstpage :
226
Lastpage :
230
Abstract :
We fabricated diamond-like-carbon (DLC) coated knife edge field emitter array (KEFEA) on the (110) oriented silicon wafer. The fabricated KEFEA have above six hundreds times of aspect ratio. Then we coated the KEFEA with 300 Å thick DLC film by PECVD method. And we measured the emission current from the KEFEA under vacuum pressure of around 2×10-7 torr. The threshold voltage of the DLC-coated KEFEA lowered about 200 V compared with the bare Si KEFEA. By coating the DLC film, its emission stability was dramatically improved. A simulation on the emitter has been performed by using MAXWELL software
Keywords :
CVD coatings; carbon; electron field emission; vacuum microelectronics; (110) oriented silicon wafer; DLC film; KEFEA; MAXWELL software; PECVD coating; Si-C; aspect ratio; diamond-like carbon; fabrication; knife edge field emitter array; simulation; threshold voltage; Crystallization; Etching; Fabrication; Field emitter arrays; Optical films; Semiconductor films; Silicon; Software performance; Thermal conductivity; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location :
St. Petersburg
Print_ISBN :
0-7803-3594-5
Type :
conf
DOI :
10.1109/IVMC.1996.601813
Filename :
601813
Link To Document :
بازگشت