• DocumentCode
    3293007
  • Title

    In Situ Particle Monitors: The Next Level of Yield Control for Critical Processes

  • Author

    Burghard, Ray ; Moriya, Tsuyoshi ; Matsuzaki, Kazuyoshi ; Nagaike, Hiroshi ; Nakayama, Hiroyuki

  • Author_Institution
    INFICON Inc., Syracuse
  • fYear
    2006
  • fDate
    25-27 Sept. 2006
  • Firstpage
    7
  • Lastpage
    10
  • Abstract
    In situ particle monitors (ISPM) have been used in the semiconductor industry for many years to monitor chamber condition before and after preventative maintenance. New improvements in particle detection technology combined with novel methods to remove particles from the chamber are proving that ISPM technology is a key component in the fight to improve product yields.
  • Keywords
    condition monitoring; design for manufacture; integrated circuit manufacture; preventive maintenance; chamber condition monitoring; critical processes; in situ particle monitors; particle detection technology; preventative maintenance; semiconductor industry; yield control; Counting circuits; Electronics industry; Etching; Particle measurements; Particle production; Plasma measurements; Pollution measurement; Process control; Semiconductor device measurement; Sensor systems;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
  • Conference_Location
    Tokyo
  • ISSN
    1523-553X
  • Print_ISBN
    978-4-9904138-0-4
  • Type

    conf

  • DOI
    10.1109/ISSM.2006.4493008
  • Filename
    4493008
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3293007