DocumentCode :
3293070
Title :
The investigation of diamond field emission arrays
Author :
Li, Qiong ; Xu, Jingfang ; Liu, Xinfu ; Chen, Chunhui ; Fan, Zhong
Author_Institution :
Dept. of Electron. Sci. & Technol., East China Normal Univ., Shanghai, China
fYear :
1996
fDate :
7-12 Jul 1996
Firstpage :
320
Lastpage :
324
Abstract :
To investigate the dependence of emission property of diamond film on the technique used in the film depositions, Field Emitter Arrays (FEAs) with diamond emission surface were manufactured by two different method, with the diamond films being deposited by two techniques. These FEAs were measured, the I-V curves were analyzed, compared and discussed, and some conclusions were given
Keywords :
diamond; electron field emission; etching; ion beam applications; plasma CVD; vacuum microelectronics; C; FEA; I-V curves; diamond emission surface; diamond field emitter arrays; emission property; film deposition technique dependence; ion beam assisted deposition; mold method; mould method; Argon; Electron emission; Field emitter arrays; Manufacturing; Semiconductor films; Silicon; Testing; Thermal conductivity; Thermal resistance; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location :
St. Petersburg
Print_ISBN :
0-7803-3594-5
Type :
conf
DOI :
10.1109/IVMC.1996.601833
Filename :
601833
Link To Document :
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