DocumentCode
3293070
Title
The investigation of diamond field emission arrays
Author
Li, Qiong ; Xu, Jingfang ; Liu, Xinfu ; Chen, Chunhui ; Fan, Zhong
Author_Institution
Dept. of Electron. Sci. & Technol., East China Normal Univ., Shanghai, China
fYear
1996
fDate
7-12 Jul 1996
Firstpage
320
Lastpage
324
Abstract
To investigate the dependence of emission property of diamond film on the technique used in the film depositions, Field Emitter Arrays (FEAs) with diamond emission surface were manufactured by two different method, with the diamond films being deposited by two techniques. These FEAs were measured, the I-V curves were analyzed, compared and discussed, and some conclusions were given
Keywords
diamond; electron field emission; etching; ion beam applications; plasma CVD; vacuum microelectronics; C; FEA; I-V curves; diamond emission surface; diamond field emitter arrays; emission property; film deposition technique dependence; ion beam assisted deposition; mold method; mould method; Argon; Electron emission; Field emitter arrays; Manufacturing; Semiconductor films; Silicon; Testing; Thermal conductivity; Thermal resistance; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location
St. Petersburg
Print_ISBN
0-7803-3594-5
Type
conf
DOI
10.1109/IVMC.1996.601833
Filename
601833
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