DocumentCode
3293158
Title
Quantum compact model for ultra-narrow body FinFET
Author
Tang, Mingchun ; Prégaldiny, Fabien ; Lallement, Christophe ; Sallese, Jean-Michel
Author_Institution
InESS, Univ. of Strasbourg, Strasbourg
fYear
2009
fDate
18-20 March 2009
Firstpage
293
Lastpage
296
Abstract
Quantum mechanical effects (QME) are very significant in undoped (or lightly doped) FinFET with ultra-narrow silicon body. In this work, we present an explicit modeling of QME well-suited for FinFET compact modeling. Our model accounts for the Fin width dependence and predicts with accuracy the increase of threshold voltage and the decrease of drain saturation current due to QME. The modeling of both transconductance and output conductance gives evidence for the continuity and the differentiability of the model. Comparison with 3-D numerical simulations performed for different Fin widths shows the good behavior of the model in all regimes of FinFET operation.
Keywords
MOSFET; quantum optics; semiconductor device models; FinFET; quantum compact model; quantum mechanical effects; ultra narrow body; Analytical models; Electronic mail; Electrons; FinFETs; Laboratories; MOSFET circuits; Photonic band gap; Quantum mechanics; Silicon; Threshold voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Ultimate Integration of Silicon, 2009. ULIS 2009. 10th International Conference on
Conference_Location
Aachen
Print_ISBN
978-1-4244-3704-7
Type
conf
DOI
10.1109/ULIS.2009.4897593
Filename
4897593
Link To Document