DocumentCode :
3293158
Title :
Quantum compact model for ultra-narrow body FinFET
Author :
Tang, Mingchun ; Prégaldiny, Fabien ; Lallement, Christophe ; Sallese, Jean-Michel
Author_Institution :
InESS, Univ. of Strasbourg, Strasbourg
fYear :
2009
fDate :
18-20 March 2009
Firstpage :
293
Lastpage :
296
Abstract :
Quantum mechanical effects (QME) are very significant in undoped (or lightly doped) FinFET with ultra-narrow silicon body. In this work, we present an explicit modeling of QME well-suited for FinFET compact modeling. Our model accounts for the Fin width dependence and predicts with accuracy the increase of threshold voltage and the decrease of drain saturation current due to QME. The modeling of both transconductance and output conductance gives evidence for the continuity and the differentiability of the model. Comparison with 3-D numerical simulations performed for different Fin widths shows the good behavior of the model in all regimes of FinFET operation.
Keywords :
MOSFET; quantum optics; semiconductor device models; FinFET; quantum compact model; quantum mechanical effects; ultra narrow body; Analytical models; Electronic mail; Electrons; FinFETs; Laboratories; MOSFET circuits; Photonic band gap; Quantum mechanics; Silicon; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Ultimate Integration of Silicon, 2009. ULIS 2009. 10th International Conference on
Conference_Location :
Aachen
Print_ISBN :
978-1-4244-3704-7
Type :
conf
DOI :
10.1109/ULIS.2009.4897593
Filename :
4897593
Link To Document :
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