Analysis and Risk Communication of 20 Years of Exposure Monitoring of Photolithography Solvents from all Intel Fabs

Twenty years of air sampling of 16 volatile solvents in photolithography from Intel fabs were analyzed. The 95% upper confidence limit of the 95th percentile of the samples were one-half or less than the full-shift occupational exposure limits. Each air sample was converted to a single, 15-minute exposure for comparison to the short-term exposure limits (STEL). The calculation indicated it was unlikely that the STEL values were exceeded. Inhalation exposures to the solvents have been acceptably low and well controlled for full-shift and for short-term exposure durations over many generations of processes, process equipment, and job duties.