• DocumentCode
    3293168
  • Title

    A new approach for measuring P-N junction depth of textured silicon solar cells

  • Author

    Wu, W. ; Li, P.R. ; Zhang, L. ; Li, J. ; Wang, Y.F. ; Ma, Z.Q.

  • Author_Institution
    SHU-SOLARE R&D Joint-Lab., Shanghai Univ., Shanghai, China
  • fYear
    2009
  • fDate
    6-10 July 2009
  • Firstpage
    616
  • Lastpage
    618
  • Abstract
    It´s difficult to measure junction depth because the junction is not in horizontal direction in textured silicon solar cells. In this paper a new, accurate junction depth measurement technique for textured silicon solar cells is investigated. Both experience and experimental data indicate that the measurement technique we used is feasible.
  • Keywords
    p-n junctions; solar cells; P-N junction depth measurement; textured silicon solar cells; Atomic measurements; Electrical resistance measurement; Etching; Oxidation; P-n junctions; Photovoltaic cells; Semiconductor device measurement; Silicon; Surface resistance; Ultrasonic variables measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
  • Conference_Location
    Suzhou, Jiangsu
  • ISSN
    1946-1542
  • Print_ISBN
    978-1-4244-3911-9
  • Electronic_ISBN
    1946-1542
  • Type

    conf

  • DOI
    10.1109/IPFA.2009.5232569
  • Filename
    5232569