DocumentCode :
3293168
Title :
A new approach for measuring P-N junction depth of textured silicon solar cells
Author :
Wu, W. ; Li, P.R. ; Zhang, L. ; Li, J. ; Wang, Y.F. ; Ma, Z.Q.
Author_Institution :
SHU-SOLARE R&D Joint-Lab., Shanghai Univ., Shanghai, China
fYear :
2009
fDate :
6-10 July 2009
Firstpage :
616
Lastpage :
618
Abstract :
It´s difficult to measure junction depth because the junction is not in horizontal direction in textured silicon solar cells. In this paper a new, accurate junction depth measurement technique for textured silicon solar cells is investigated. Both experience and experimental data indicate that the measurement technique we used is feasible.
Keywords :
p-n junctions; solar cells; P-N junction depth measurement; textured silicon solar cells; Atomic measurements; Electrical resistance measurement; Etching; Oxidation; P-n junctions; Photovoltaic cells; Semiconductor device measurement; Silicon; Surface resistance; Ultrasonic variables measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location :
Suzhou, Jiangsu
ISSN :
1946-1542
Print_ISBN :
978-1-4244-3911-9
Electronic_ISBN :
1946-1542
Type :
conf
DOI :
10.1109/IPFA.2009.5232569
Filename :
5232569
Link To Document :
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