DocumentCode
3293168
Title
A new approach for measuring P-N junction depth of textured silicon solar cells
Author
Wu, W. ; Li, P.R. ; Zhang, L. ; Li, J. ; Wang, Y.F. ; Ma, Z.Q.
Author_Institution
SHU-SOLARE R&D Joint-Lab., Shanghai Univ., Shanghai, China
fYear
2009
fDate
6-10 July 2009
Firstpage
616
Lastpage
618
Abstract
It´s difficult to measure junction depth because the junction is not in horizontal direction in textured silicon solar cells. In this paper a new, accurate junction depth measurement technique for textured silicon solar cells is investigated. Both experience and experimental data indicate that the measurement technique we used is feasible.
Keywords
p-n junctions; solar cells; P-N junction depth measurement; textured silicon solar cells; Atomic measurements; Electrical resistance measurement; Etching; Oxidation; P-n junctions; Photovoltaic cells; Semiconductor device measurement; Silicon; Surface resistance; Ultrasonic variables measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location
Suzhou, Jiangsu
ISSN
1946-1542
Print_ISBN
978-1-4244-3911-9
Electronic_ISBN
1946-1542
Type
conf
DOI
10.1109/IPFA.2009.5232569
Filename
5232569
Link To Document