DocumentCode :
3293284
Title :
Modifications of fillet structures to form tip emitters
Author :
Fleming, J.G. ; King, Donald B. ; Talin, A.A. ; Felter, T. ; Malinowski, M.
Author_Institution :
Sandia Nat. Labs., Albuquerque, NM, USA
fYear :
1996
fDate :
7-12 Jul 1996
Firstpage :
375
Lastpage :
379
Abstract :
In order to reduce the turn-on voltage of vacuum microelectronic devices, it is desirable that the field enhancement of the emitter be maximized. We have previously developed a gated manufacturable emitter process which uses fillets as emitters. Since tips have higher field enhancement then fillets we have tried to adapt our process to incorporate tip emitters. Two different approaches have been developed to try to achieve this goal. The first approach employs a sputter etch to form a tip on the end of a spike. Unfortunately, the tip formed is not sufficiently sharp enough to reduce the turn on voltage. In the second approach, the corners of a mold are sharpened during the deposition of the spacer material. The emitter material is then deposited and following the removal of the spacer, a very sharp tip remains
Keywords :
electron field emission; sputter etching; vacuum microelectronics; field enhancement; fillet structures; mold corners; spacer material; sputter etch; tip emitters; turn-on voltage; vacuum microelectronic devices; Amorphous materials; Fabrication; Laboratories; Lithography; Microelectronics; Silicon compounds; Sputter etching; Substrates; Tin; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location :
St. Petersburg
Print_ISBN :
0-7803-3594-5
Type :
conf
DOI :
10.1109/IVMC.1996.601845
Filename :
601845
Link To Document :
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