• DocumentCode
    3293401
  • Title

    A new method of fabrication of all-metal tips for field emission arrays

  • Author

    Gavrilov, M.V. ; Kolosov, V.V. ; Prokhorov, V.V. ; Mironov, B.N. ; Khazanov, A.A.

  • Author_Institution
    Saratov State Univ., Russia
  • fYear
    1996
  • fDate
    7-12 Jul 1996
  • Firstpage
    403
  • Lastpage
    405
  • Abstract
    A new method of fabrication of metal tips using an oxygen/argon plasma has been developed and the tips have been formed and tested in a magnetron sputtering diode. The tip cones obtained were quite uniform, with the height of the tips about 100-150 micron or 300-500 micron. The method may be applied for increasing the FEA reliability
  • Keywords
    electron field emission; reliability; sputter etching; vacuum microelectronics; 100 to 500 micron; Ar; FEA reliability; O2; O2-Ar; O2/A plasma; all-metal tips; fabrication; field emission arrays; magnetron sputtering diode; metal tip forming; Argon; Cathodes; Diodes; Fabrication; Field emitter arrays; Magnetic separation; Plasma applications; Plasma devices; Sputtering; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
  • Conference_Location
    St. Petersburg
  • Print_ISBN
    0-7803-3594-5
  • Type

    conf

  • DOI
    10.1109/IVMC.1996.601851
  • Filename
    601851
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3293401