DocumentCode :
3293401
Title :
A new method of fabrication of all-metal tips for field emission arrays
Author :
Gavrilov, M.V. ; Kolosov, V.V. ; Prokhorov, V.V. ; Mironov, B.N. ; Khazanov, A.A.
Author_Institution :
Saratov State Univ., Russia
fYear :
1996
fDate :
7-12 Jul 1996
Firstpage :
403
Lastpage :
405
Abstract :
A new method of fabrication of metal tips using an oxygen/argon plasma has been developed and the tips have been formed and tested in a magnetron sputtering diode. The tip cones obtained were quite uniform, with the height of the tips about 100-150 micron or 300-500 micron. The method may be applied for increasing the FEA reliability
Keywords :
electron field emission; reliability; sputter etching; vacuum microelectronics; 100 to 500 micron; Ar; FEA reliability; O2; O2-Ar; O2/A plasma; all-metal tips; fabrication; field emission arrays; magnetron sputtering diode; metal tip forming; Argon; Cathodes; Diodes; Fabrication; Field emitter arrays; Magnetic separation; Plasma applications; Plasma devices; Sputtering; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location :
St. Petersburg
Print_ISBN :
0-7803-3594-5
Type :
conf
DOI :
10.1109/IVMC.1996.601851
Filename :
601851
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3293401
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