DocumentCode :
3293680
Title :
Thermal conductivity studies of a GaN-sapphire structure by combined scanning thermal microscopy and electron backscatter diffraction
Author :
Zhang, Y.F. ; Wang, L. ; Ji, Y. ; Han, X.D. ; Zhang, Z. ; Heiderhoff, R. ; Tiedemann, A.K. ; Balk, L.J.
Author_Institution :
Inst. of Microstructure & Property of Adv. Mater., Beijing Univ. of Technol., Beijing, China
fYear :
2009
fDate :
6-10 July 2009
Firstpage :
520
Lastpage :
522
Abstract :
Scanning thermal microscope (SThM) and electron backscatter diffraction (EBSD) techniques were used to investigate the local thermal-conductivity of a GaN-buffer-sapphire heterostructure. Compared with GaN epilayer, buffer layer displayed the low thermal-conductivity and the high strain state due to the lattice distortion.
Keywords :
III-V semiconductors; electron backscattering; gallium compounds; sapphire; thermal conductivity; thermal conductivity measurement; wide band gap semiconductors; GaN; combined scanning thermal microscopy; electron backscatter diffraction; lattice distortion; sapphire structure; thermal conductivity studies; Backscatter; Buffer layers; Conductivity measurement; Diffraction; Gallium nitride; Lattices; Light emitting diodes; Scanning electron microscopy; Strain measurement; Thermal conductivity;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location :
Suzhou, Jiangsu
ISSN :
1946-1542
Print_ISBN :
978-1-4244-3911-9
Electronic_ISBN :
1946-1542
Type :
conf
DOI :
10.1109/IPFA.2009.5232593
Filename :
5232593
Link To Document :
بازگشت