DocumentCode
3293707
Title
Affirmation of minority carrier lifetime during industrial process of crystalline silicon solar cell by microwave phtonconductance decay method
Author
Meng, X.J. ; Ma, Z.Q. ; Lv, P. ; Yu, Z.S. ; Li, F.
Author_Institution
Dept. of Phys., Shanghai Univ., Baoshan, China
fYear
2009
fDate
6-10 July 2009
Firstpage
511
Lastpage
514
Abstract
Minority carrier lifetime was determined by MW-PCD method following the industry process well and truly. The wafer as-cut without any treatment showed an effective lifetime about 1.2mus. Then it rose to 2.5~5mus after one side was passivated by silicon nitride. The average lifetime with double layer passivation sharply increased to 48mus average, even over 100mus locally. The escape of hydrogen was discovered after sintering. The electron collection ability between Ag and Al was also compared by effective lifetime testing.
Keywords
carrier lifetime; elemental semiconductors; life testing; minority carriers; passivation; silicon; silicon compounds; sintering; solar cells; Si; crystalline silicon solar cell; double layer passivation; electron collection; industrial process; lifetime testing; microwave phtonconductance decay method; minority carrier lifetime; silicon nitride; sintering; Charge carrier density; Charge carrier lifetime; Crystallization; Diffusion processes; Masers; Microwave theory and techniques; Passivation; Photoconductivity; Photovoltaic cells; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location
Suzhou, Jiangsu
ISSN
1946-1542
Print_ISBN
978-1-4244-3911-9
Electronic_ISBN
1946-1542
Type
conf
DOI
10.1109/IPFA.2009.5232595
Filename
5232595
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