Title :
Analysis on contact failure of instrument and control switch in nuclear power plant
Author :
Jie, Shi ; Jianlin, Yao ; Yongnian, Wang ; Haining, Shi ; Fengsheng, Tu
Author_Institution :
Suzhou Nucl. Power Instn., Suzhou, China
Abstract :
For understanding the law that the trend of contact resistance follows the changed current, an equipment which was made up of an intelligent multi-function data acquisition, cooperated with PC programs, for measuring contact resistance was developed. The scanning electron microscopy(SEM) and Energy Dispersive Analysis System of X-ray were used to analyse the microstructure of contact. By observing the microcosmic appearance and analysing the component of contact, the failure reasons was confirmed.
Keywords :
X-ray microscopy; failure analysis; nuclear power stations; scanning electron microscopy; X-ray; contact failure analysis; contact resistance; control switch; energy dispersive analysis system; intelligent multi-function data acquisition; microcosmic appearance; nuclear power plant; scanning electron microscopy; Contact resistance; Current measurement; Data acquisition; Dispersion; Electrical resistance measurement; Failure analysis; Instruments; Power generation; Scanning electron microscopy; Switches;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location :
Suzhou, Jiangsu
Print_ISBN :
978-1-4244-3911-9
Electronic_ISBN :
1946-1542
DOI :
10.1109/IPFA.2009.5232601