DocumentCode :
329392
Title :
Fuzzy control of temperature in a semiconductor processing furnace
Author :
Ramiller, Charles L. ; Chow, Mo-Yuen ; Kuehn, Richard T.
Author_Institution :
North Carolina State Univ., Raleigh, NC, USA
Volume :
3
fYear :
1998
fDate :
31 Aug-4 Sep 1998
Firstpage :
1774
Abstract :
The ability to control temperature in semiconductor processing furnaces is critical to the manufacturing of semiconductor devices. In this paper, a fuzzy PI controller is described that takes into account some of the unique characteristics of such a furnace. Entries in the rule base are used to prevent integrator windup and a fuzzy gain scheduler allows the controller to be tuned once and used over the whole operating temperature range of the system. Substantial improvements are shown for settling times following both large and small step changes in reference setpoint
Keywords :
control system analysis; control system synthesis; furnaces; fuzzy control; process control; semiconductor device manufacture; semiconductor technology; temperature control; two-term control; control design; control simulaton; fuzzy PI controller; fuzzy gain scheduler; fuzzy temperature control; manufacturing; operating temperature range; rule base; semiconductor processing furnace; settling times; Control systems; Furnaces; Fuzzy control; Fuzzy systems; Job shop scheduling; Manufacturing processes; Semiconductor device manufacture; Semiconductor devices; Temperature control; Windup;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Industrial Electronics Society, 1998. IECON '98. Proceedings of the 24th Annual Conference of the IEEE
Conference_Location :
Aachen
Print_ISBN :
0-7803-4503-7
Type :
conf
DOI :
10.1109/IECON.1998.722955
Filename :
722955
Link To Document :
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