Title :
Optical control of microstrip stub on silicon substrate using 650 nm and 850 nm wavelengths illumination
Author :
Bhadauria, Avanish ; Sharma, Enakshi Khular ; Verma, A.K. ; Singh, B.R.
Author_Institution :
Central Electron. Eng. Res. Inst., Pilani
fDate :
Sept. 9 2008-Oct. 3 2008
Abstract :
In this paper we have studied the optical control of transmission behaviour of lambdag/4 microstrip stub on a microstrip line fabricated on high resistivity silicon substrate by illuminating open end of lambdag/4 stub. Here, we have used two different optical wavelength sources 650 nm and 850 nm to illuminate the open end of stub. An optical illumination at the end of an open lambdag/4 stub on a microstrip line has been shown to control the transmitted power at the design frequency which can be used as an optically controlled rf switching or attenuator and further can be used as an optically controlled narrow band matching and stub based filters. In addition to experimental measurement we have also carried out modelling of optically generated load at the end for both the wavelengths along with the simulation on Ansoft Maxwell simulator. The measurement results compare well with those predicted by a simulation carried out on the Ansoft Maxwell Ensemble for both the wavelengths.
Keywords :
microstrip lines; microwave photonics; Si; high resistivity substrate; microstrip line; microstrip stub; narrow band matching; optical control; optical illumination; optical wavelength sources; radiofrequency attenuator; radiofrequency switching; silicon substrate; stub based filters; wavelength 650 nm; wavelength 850 nm; Conductivity; Frequency; Lighting; Microstrip filters; Optical attenuators; Optical control; Optical design; Optical filters; Silicon; Wavelength measurement;
Conference_Titel :
Microwave photonics, 2008. jointly held with the 2008 asia-pacific microwave photonics conference. mwp/apmp 2008. international topical meeting on
Conference_Location :
Gold Coast, Qld
Print_ISBN :
978-1-4244-2168-8
Electronic_ISBN :
978-1-4244-2169-5
DOI :
10.1109/MWP.2008.4666655