DocumentCode :
3294440
Title :
Wet etch recipe development for removing lead-free C4 bumps
Author :
Qibin, Liu ; Xiaole, Zhao ; Weidong, Huang ; Chin, J.M.
Author_Institution :
Device Anal. Lab., AMD Suzhou, Suzhou, China
fYear :
2009
fDate :
6-10 July 2009
Firstpage :
360
Lastpage :
362
Abstract :
To protect the environment, lead-free solder will be introduced in microelectronic products to replace lead solder. Proper lead-free bump removal is very important to the success of subsequent analysis steps. In this paper, a state-of-the-art wet etch recipe has been developed to remove Sn-Ag-Cu bumps. By optimizing the recipe, the resulting process has enabled the authors to identify defects within failing devices through front-side deprocessing.
Keywords :
environmental factors; etching; controlled collapse chip connection; front-side deprocessing; lead-free C4 bumps; lead-free bump removal; lead-free solder; microelectronic products; wet etch recipe development; Chemical processes; Environmentally friendly manufacturing techniques; Failure analysis; Lead; Microelectronics; Packaging; Passivation; Polyimides; Protection; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location :
Suzhou, Jiangsu
ISSN :
1946-1542
Print_ISBN :
978-1-4244-3911-9
Electronic_ISBN :
1946-1542
Type :
conf
DOI :
10.1109/IPFA.2009.5232631
Filename :
5232631
Link To Document :
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