DocumentCode
3294471
Title
Novel Use of Discrete SEM Inspection to Supplement and Refine Inline Defect Inspection During 65nm MirrorBit Development
Author
Nagatani, Go ; Sakai, Stacy ; Yu, Haijiang ; Yang, Bin
Author_Institution
Spansion Inc., Sunnyvale
fYear
2006
fDate
25-27 Sept. 2006
Firstpage
321
Lastpage
324
Abstract
As technology nodes continue to shrink, the role of scanning electron microscope (SEM) has become more than just a review tool. Systematic discrete SEM inspections can serve as inline responses to process experiments, providing quantitative defectivity information for defects that may be difficult to identify by common bright field tools. In addition, this methodology provides means to further refine the automated bright field inspection recipes towards the defect of interest.
Keywords
inspection; integrated circuit manufacture; scanning electron microscopy; MirrorBit; automated bright field inspection; defect of interest; discrete SEM inspections; integrated circuits industry; quantitative defectivity information; scanning electron microscope; size 65 nm; Electronics industry; Feedback; Inspection; Integrated circuit yield; Refining; Robustness; Scanning electron microscopy; Silicides; Silicon compounds; Wheels;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location
Tokyo
ISSN
1523-553X
Print_ISBN
978-4-9904138-0-4
Type
conf
DOI
10.1109/ISSM.2006.4493095
Filename
4493095
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