Title :
Novel Use of Discrete SEM Inspection to Supplement and Refine Inline Defect Inspection During 65nm MirrorBit Development
Author :
Nagatani, Go ; Sakai, Stacy ; Yu, Haijiang ; Yang, Bin
Author_Institution :
Spansion Inc., Sunnyvale
Abstract :
As technology nodes continue to shrink, the role of scanning electron microscope (SEM) has become more than just a review tool. Systematic discrete SEM inspections can serve as inline responses to process experiments, providing quantitative defectivity information for defects that may be difficult to identify by common bright field tools. In addition, this methodology provides means to further refine the automated bright field inspection recipes towards the defect of interest.
Keywords :
inspection; integrated circuit manufacture; scanning electron microscopy; MirrorBit; automated bright field inspection; defect of interest; discrete SEM inspections; integrated circuits industry; quantitative defectivity information; scanning electron microscope; size 65 nm; Electronics industry; Feedback; Inspection; Integrated circuit yield; Refining; Robustness; Scanning electron microscopy; Silicides; Silicon compounds; Wheels;
Conference_Titel :
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-4-9904138-0-4
DOI :
10.1109/ISSM.2006.4493095
