DocumentCode
3294475
Title
Study on the reliability of Ni/Au/AlGaN/GaN HEMTs at high temperature
Author
Fei, Li ; Xiaoling, Zhang ; Changzhi, Lu ; Yuanchun, Wang ; Qiuchen, Yuan
Author_Institution
Sch. of Electron. Inf. & Control Eng., Beijing Univ. of Technol., Beijing, China
fYear
2009
fDate
6-10 July 2009
Firstpage
352
Lastpage
355
Abstract
Fundamentals of current transports of the Ni/Au/AlGaN/GaN HEMTs have been studied under the temperature between 27degC and 250degC. It´s found that the maximum drain-source current (IDS) decreases with rising temperature, and the temperature dependent of IDS has a negative coefficient of -0.314mA/mm.degC. The decrease in mobility is considered to be the main cause of this deterioration. It´s also found that a rise in temperature accompanies an increase in barrier height and a decrease in ideality factor. The remarkable finding is that reverse leakage current increases first and then decreases with rising temperature.
Keywords
III-V semiconductors; aluminium compounds; gallium compounds; gold; high electron mobility transistors; leakage currents; nickel; semiconductor device reliability; wide band gap semiconductors; AlGaN-GaN; Ni-Au; drain-source current; high electron mobility transistors; ideality factor; reverse leakage current; semiconductor device reliability; temperature 27 degC to 250 degC; Aluminum gallium nitride; Gallium nitride; Gold; HEMTs; Intrusion detection; Leakage current; MODFETs; Photonic band gap; Schottky barriers; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location
Suzhou, Jiangsu
ISSN
1946-1542
Print_ISBN
978-1-4244-3911-9
Electronic_ISBN
1946-1542
Type
conf
DOI
10.1109/IPFA.2009.5232633
Filename
5232633
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