Title :
Study on the reliability of Ni/Au/AlGaN/GaN HEMTs at high temperature
Author :
Fei, Li ; Xiaoling, Zhang ; Changzhi, Lu ; Yuanchun, Wang ; Qiuchen, Yuan
Author_Institution :
Sch. of Electron. Inf. & Control Eng., Beijing Univ. of Technol., Beijing, China
Abstract :
Fundamentals of current transports of the Ni/Au/AlGaN/GaN HEMTs have been studied under the temperature between 27degC and 250degC. It´s found that the maximum drain-source current (IDS) decreases with rising temperature, and the temperature dependent of IDS has a negative coefficient of -0.314mA/mm.degC. The decrease in mobility is considered to be the main cause of this deterioration. It´s also found that a rise in temperature accompanies an increase in barrier height and a decrease in ideality factor. The remarkable finding is that reverse leakage current increases first and then decreases with rising temperature.
Keywords :
III-V semiconductors; aluminium compounds; gallium compounds; gold; high electron mobility transistors; leakage currents; nickel; semiconductor device reliability; wide band gap semiconductors; AlGaN-GaN; Ni-Au; drain-source current; high electron mobility transistors; ideality factor; reverse leakage current; semiconductor device reliability; temperature 27 degC to 250 degC; Aluminum gallium nitride; Gallium nitride; Gold; HEMTs; Intrusion detection; Leakage current; MODFETs; Photonic band gap; Schottky barriers; Temperature dependence;
Conference_Titel :
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location :
Suzhou, Jiangsu
Print_ISBN :
978-1-4244-3911-9
Electronic_ISBN :
1946-1542
DOI :
10.1109/IPFA.2009.5232633