• DocumentCode
    3294475
  • Title

    Study on the reliability of Ni/Au/AlGaN/GaN HEMTs at high temperature

  • Author

    Fei, Li ; Xiaoling, Zhang ; Changzhi, Lu ; Yuanchun, Wang ; Qiuchen, Yuan

  • Author_Institution
    Sch. of Electron. Inf. & Control Eng., Beijing Univ. of Technol., Beijing, China
  • fYear
    2009
  • fDate
    6-10 July 2009
  • Firstpage
    352
  • Lastpage
    355
  • Abstract
    Fundamentals of current transports of the Ni/Au/AlGaN/GaN HEMTs have been studied under the temperature between 27degC and 250degC. It´s found that the maximum drain-source current (IDS) decreases with rising temperature, and the temperature dependent of IDS has a negative coefficient of -0.314mA/mm.degC. The decrease in mobility is considered to be the main cause of this deterioration. It´s also found that a rise in temperature accompanies an increase in barrier height and a decrease in ideality factor. The remarkable finding is that reverse leakage current increases first and then decreases with rising temperature.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; gold; high electron mobility transistors; leakage currents; nickel; semiconductor device reliability; wide band gap semiconductors; AlGaN-GaN; Ni-Au; drain-source current; high electron mobility transistors; ideality factor; reverse leakage current; semiconductor device reliability; temperature 27 degC to 250 degC; Aluminum gallium nitride; Gallium nitride; Gold; HEMTs; Intrusion detection; Leakage current; MODFETs; Photonic band gap; Schottky barriers; Temperature dependence;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
  • Conference_Location
    Suzhou, Jiangsu
  • ISSN
    1946-1542
  • Print_ISBN
    978-1-4244-3911-9
  • Electronic_ISBN
    1946-1542
  • Type

    conf

  • DOI
    10.1109/IPFA.2009.5232633
  • Filename
    5232633