Analysis of alignment modeling for Nikon steppers

Author

He, Feng ; Wang, Jun ; Wu, Zhiming ; Jiang, Yadong ; Yuan, Kai

Author_Institution

State Key Lab. of Electron. Thin Films & Integrated Devices, Univ. of Electron. Sci. & Technol. of China, Chengdu, China

fYear

2009

fDate

6-10 July 2009

Firstpage

356

Lastpage

359

Abstract

The alignment system, as one of key component for stepper, developed rapidly in the last few years because of huge requirement on advanced exposing tools for VLSI and MEMS. Alignment accuracy is mainly affected by errors coming from mark deformations and optical system. In this paper, we combined mathematical model of Nikon stepper alignment optical system and analyzed alignment errors of Nikon stepper caused by mark deformation in different processes. The model was verified by different experiments. Finally some improvement process is put forward to enhance alignment accuracy.

Keywords

integrated circuit manufacture; optical design techniques; photolithography; wafer-scale integration; Nikon steppers; alignment modeling; mark deformation; Etching; Gratings; Mathematical model; Optical diffraction; Optical films; Optical interferometry; Optical sensors; Semiconductor device modeling; Signal processing; Very large scale integration;

fLanguage

English

Publisher

ieee

Conference_Titel

Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the

Conference_Location

Suzhou, Jiangsu

ISSN

1946-1542

Print_ISBN

978-1-4244-3911-9

Electronic_ISBN

1946-1542

Type

conf

DOI

10.1109/IPFA.2009.5232634

Filename

5232634