Title :
A Technique for Co Target Discharge Stabilization Using an Ion Gauge in the Sputtering System
Author :
Muraoka, Tatsuo ; Kobayashi, Kazunori
Author_Institution :
Fujitsu Ltd., Aizuwakamatsu
Abstract :
Cobalt sputtering has a disadvantage in the lost operation time resulting from unstable discharge when cobalt is deposited on the shield. We successfully achieved stable discharge by utilizing an ion gauge instead of an igniter, even during sputtering, to supply thermal electrons to the discharge space. This technique doubles productivity.
Keywords :
cobalt; sputtering; Co; ion gauge; sputtering system; target discharge stabilization; thermal electrons; Cities and towns; Cobalt; Electrons; Fault location; Manufacturing processes; Pressure measurement; Productivity; Semiconductor device manufacture; Sputtering; Voltage;
Conference_Titel :
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location :
Tokyo
Print_ISBN :
978-4-9904138-0-4
DOI :
10.1109/ISSM.2006.4493114
