DocumentCode :
3294981
Title :
The Static Elimination System with Soft X-ray Air Ionizer Used in ULSI Cleanroom
Author :
Sakuyama, Masafumi ; Takeuchi, Manabu ; Terasige, Takashi ; Ujiie, Shouta ; Okano, Kazuo
Author_Institution :
Ibaraki Univ., Mito
fYear :
2006
fDate :
25-27 Sept. 2006
Firstpage :
424
Lastpage :
427
Abstract :
Soft X-ray air ionizers are widely used for static control in semiconductor manufacturing processes because of the contamination free ionizer. However, the positive ions and the negative ions would recombine each other in transport process. In addition, the elimination time that is the time for eliminating charged bodies would get longer. So we propose the static elimination system with a soft X-ray air ionizer in order to reduce the effect of recombination and shorten the elimination time. The static elimination system was designed, made, and evaluated. As a result, the elimination time of the system operated under the optimum condition is 2.5 times shorter than a conventional soft X-ray air ionizer.
Keywords :
ULSI; X-rays; clean rooms; integrated circuit manufacture; ULSI cleanroom; charged bodies; contamination free ionizer; negative ions; positive ions; semiconductor manufacturing processes; soft X-ray air ionizer; static control; static elimination system; transport process; Contamination; Control systems; Current measurement; Pollution measurement; Radiative recombination; Tellurium; Time measurement; Ultra large scale integration; Voltage control; Voltage measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing, 2006. ISSM 2006. IEEE International Symposium on
Conference_Location :
Tokyo
ISSN :
1523-553X
Print_ISBN :
978-4-9904138-0-4
Type :
conf
DOI :
10.1109/ISSM.2006.4493126
Filename :
4493126
Link To Document :
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