DocumentCode :
3295409
Title :
Plastic packaging stress induced failures in TiW/Al-Si metal to silicide contacts
Author :
Kitagawa, Hideki ; Maeda, Takayuki ; Murata, Shinya ; Maki, Tatsuro ; Kaeriyama, Toshiyuki ; Hyslop, Adin ; Nishimura, Aki
Author_Institution :
Texas Instrum. Japan Ltd., Ibaraki, Japan
fYear :
1988
fDate :
12-14 Apr 1988
Firstpage :
71
Lastpage :
75
Abstract :
The effects of long-term temperature/humidity stress on a TiW/Al-Si-TiSi2 metal contact system were investigated. Plastic packaged DRAM test sites were subjected to conventional unbiased humidity testing procedures which induced electrical opens. Failure analysis showed these opens to occur in the contact region. The nature of this phenomenon was studied. It was found that plastic-package-induced shear stress causes plastic deformation of Al-Si and forces it into the contact hole. The mass built up inside the contact hole increases, causing an alloy formation, and can eventually lift the metal from the diffusion surface, causing the electrical open circuit to occur. One proposed solution is to enhance the protective overcoat´s ability to absorb this stress and thus minimize its transmittal to the metallization system
Keywords :
aluminium alloys; environmental testing; failure analysis; integrated circuit testing; metallisation; packaging; silicon alloys; titanium alloys; tungsten alloys; DRAM test sites; TiW-AlSi-TiSi2; alloy formation; contact hole; electrical opens; failure analysis; humidity testing; long-term temperature/humidity stress; metal to silicide contacts; metallization system; plastic deformation; plastic-package-induced shear stress; Circuits; Contacts; Failure analysis; Humidity; Plastic packaging; Protection; Random access memory; Stress; Temperature; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium 1988. 26th Annual Proceedings., International
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/RELPHY.1988.23429
Filename :
23429
Link To Document :
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