DocumentCode :
3296083
Title :
Reliability of discrete MODFETs: life testing, radiation effects, and ESD
Author :
Anderson, W.T. ; Christou, A. ; Buot, F.A. ; Archer, J. ; Bechtel, G. ; Cooke, H. ; Pao, Y.C. ; Simons, M. ; Chase, E.W.
Author_Institution :
US Naval Res. Lab., Washington, DC, USA
fYear :
1988
fDate :
12-14 Apr 1988
Firstpage :
96
Lastpage :
101
Abstract :
Experimental and theoretical results of a reliability study of GaAs/AlGaAs MODFETs are presented and show a commonality of degradation modes under various accelerated stress conditions. The reliability of submicron-gate low-noise MODFETs was evaluated using high-temperature storage and DC operating life tests; significantly greater drain current degradation that occurred under DC bias is related to a field-assisted channel doping mechanism. Under pulsed electron irradiation long-term drain current transients were observed as well as persistent photoconductivity in some devices. Electrostatic-discharge experiments revealed that, unlike standard FETs, human body model (HBM) stressing of MODFETs results in loss of drain current, indicating deconfinement of the two-dimensional electron gas. The unified model of MODFET degradation is therefore related to field-assisted migration of alloy constituents and doping species
Keywords :
III-V semiconductors; aluminium compounds; discharges (electric); electron beam effects; electrostatics; gallium arsenide; high electron mobility transistors; life testing; reliability; semiconductor device testing; 2D electron gas deconfinement; DC operating life tests; ESD; GaAs-AlGaAs; MODFETs; accelerated stress conditions; degradation modes; drain current degradation; drain current transients; electrostatic discharge; field-assisted channel doping mechanism; field-assisted migration; high-temperature storage; human body model stressing; persistent photoconductivity; pulsed electron irradiation; radiation effects; reliability; Biological system modeling; Degradation; Doping; Electrons; HEMTs; Life testing; MODFETs; Radiation effects; Reliability theory; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium 1988. 26th Annual Proceedings., International
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/RELPHY.1988.23433
Filename :
23433
Link To Document :
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