• DocumentCode
    3296231
  • Title

    Failure analysis of 200 nm-thick gold interconnects induced by alternating current

  • Author

    Zhang, G.P. ; Wang, M. ; Zhang, B.

  • Author_Institution
    Shenyang Nat. Lab. for Mater. Sci., Chinese Acad. of Sci., Shenyang, China
  • fYear
    2009
  • fDate
    6-10 July 2009
  • Firstpage
    777
  • Lastpage
    781
  • Abstract
    A testing system for evaluation of failure behavior of gold interconnects subjected to alternating current was established. Thermal fatigue in gold lines has been investigated by using alternating currents to generate cyclic temperatures and thermal strains. It is found that the lifetime versus thermal cyclic strain range (Deltaepsiv) for the 2 mum-wide Au interconnect follows the conventional Coffin-Manson relationship when Deltaepsiv les 0.47%, while when Deltaepsiv > 0.47%, the damage behavior of the Au lines is dominated by excessive Joule heating.
  • Keywords
    failure analysis; gold; integrated circuit interconnections; integrated circuit reliability; integrated circuit testing; thermal analysis; Au; Coffin-Manson relationship; Joule heating; alternating current; failure analysis; failure behavior evaluation; gold interconnection; microelectronic circuit lifetime; size 2 mum; thermal cyclic strain; Capacitive sensors; Failure analysis; Fatigue; Gold; Heating; Integrated circuit interconnections; Substrates; System testing; Temperature; Thermal expansion;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
  • Conference_Location
    Suzhou, Jiangsu
  • ISSN
    1946-1542
  • Print_ISBN
    978-1-4244-3911-9
  • Electronic_ISBN
    1946-1542
  • Type

    conf

  • DOI
    10.1109/IPFA.2009.5232726
  • Filename
    5232726