DocumentCode
3296231
Title
Failure analysis of 200 nm-thick gold interconnects induced by alternating current
Author
Zhang, G.P. ; Wang, M. ; Zhang, B.
Author_Institution
Shenyang Nat. Lab. for Mater. Sci., Chinese Acad. of Sci., Shenyang, China
fYear
2009
fDate
6-10 July 2009
Firstpage
777
Lastpage
781
Abstract
A testing system for evaluation of failure behavior of gold interconnects subjected to alternating current was established. Thermal fatigue in gold lines has been investigated by using alternating currents to generate cyclic temperatures and thermal strains. It is found that the lifetime versus thermal cyclic strain range (Deltaepsiv) for the 2 mum-wide Au interconnect follows the conventional Coffin-Manson relationship when Deltaepsiv les 0.47%, while when Deltaepsiv > 0.47%, the damage behavior of the Au lines is dominated by excessive Joule heating.
Keywords
failure analysis; gold; integrated circuit interconnections; integrated circuit reliability; integrated circuit testing; thermal analysis; Au; Coffin-Manson relationship; Joule heating; alternating current; failure analysis; failure behavior evaluation; gold interconnection; microelectronic circuit lifetime; size 2 mum; thermal cyclic strain; Capacitive sensors; Failure analysis; Fatigue; Gold; Heating; Integrated circuit interconnections; Substrates; System testing; Temperature; Thermal expansion;
fLanguage
English
Publisher
ieee
Conference_Titel
Physical and Failure Analysis of Integrated Circuits, 2009. IPFA 2009. 16th IEEE International Symposium on the
Conference_Location
Suzhou, Jiangsu
ISSN
1946-1542
Print_ISBN
978-1-4244-3911-9
Electronic_ISBN
1946-1542
Type
conf
DOI
10.1109/IPFA.2009.5232726
Filename
5232726
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