DocumentCode :
3296446
Title :
Kinetic study of electromigration failure in Cr/Al-Cu thin film conductors covered with polyimide and the problem of the stress dependent activation energy
Author :
Lloyd, J.R. ; Shatzkes, M. ; Challener, D.C.
Author_Institution :
IBM, Hopewell Junction, NY, USA
fYear :
1988
fDate :
12-14 Apr 1988
Firstpage :
216
Lastpage :
225
Abstract :
The electromigration lifetime of Cr/Al-Cu conductors covered with polyimide passivation was studied as a function of temperature and current density. The activation energy for failure was found to be substantially higher than that found in studies of similar metals without polyimide. A current exponent of 2 was determined in the absence of temperature gradient failure. An improved method for calculating the activation energy for temperature gradient failure is described. The problem of the apparent stress-dependent activation energies is discussed
Keywords :
aluminium alloys; chromium; copper alloys; electromigration; failure analysis; metallic thin films; metallisation; passivation; Cr-AlCu thin film conductors; current density; current exponent; electromigration failure; electromigration lifetime; polyimide passivation; stress dependent activation energy; temperature gradient failure; Chromium; Conductive films; Conductors; Current density; Electromigration; Kinetic theory; Passivation; Polyimides; Stress; Temperature; Testing; Transistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Reliability Physics Symposium 1988. 26th Annual Proceedings., International
Conference_Location :
Monterey, CA
Type :
conf
DOI :
10.1109/RELPHY.1988.23453
Filename :
23453
Link To Document :
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