Title :
Solar cells based on atomic layer deposition
Author :
Xiaolan Sun ; Chao Li ; Yanhua Dong ; Xiaohong Liu
Author_Institution :
Key Lab. of Specialty Fiber Opt. Access Networks, Shanghai Univ., Shanghai, China
Abstract :
The advantages of atomic layer deposition (ALD) include highly controlled deposition parameters, deposition uniformity, ultra-precise film thickness and good step coverage. Its prominent characteristics have drew attention to researchers in the fields of solar cells. The heterojunction, core-shell structure and surface passivation of solar cells can be preparated by ALD to get better system performance. For example, the photoelectric conversion efficiency is improved by reducing electrons and holes recombination and protecting the cells to fulfill the utilization of energy.
Keywords :
atomic layer deposition; solar cells; ALD; atomic layer deposition; core-shell structure; deposition uniformity; electron reduction; heterojunction structure; hole recombination; photoelectric conversion efficiency; solar cells; surface passivation; ultraprecise film thickness; Atomic layer deposition; Nanometer thin film; Solar cells;
Conference_Titel :
Optical Communications and Networks (ICOCN 2010), 9th International Conference on
Conference_Location :
Nanjing
DOI :
10.1049/cp.2010.1227
