DocumentCode
3297159
Title
Resonances in photoemission from semiconductors with negative electron affinity
Author
Gerchikov, L.G. ; Subashiev, A.V.
Author_Institution
Dept of Exp. Phys., State Tech. Univ., St. Petersburg, Russia
fYear
1996
fDate
7-12 Jul 1996
Firstpage
656
Abstract
Summary form only given, as follows. The variation of the photoemission from the negative electron affinity (NEA) semiconductor surface with the position of the surface Fermi level is theoretically studied. Resonance maxima both in photoyield and the surface recombination rate (when the depth and the width of the quantum well in the band bending region (BBR) are close to the appearance of the new quantum level) are predicted as a result of quantum character of the electron motion in the BBR. The resonance BBR transmission is expected to manifest itself in the temperature, doping, and thickness of the activation layer photoyield dependence. The experimental studies of the dependencies should help to monitor the evolution of the BBR during surface activation to the NEA state
Keywords
Fermi level; electron affinity; photoemission; semiconductor quantum wells; semiconductors; surface recombination; activation layer; band bending region; negative electron affinity; photoemission resonances; photoyield; quantum well; semiconductors; surface Fermi level; surface activation; surface recombination rate; Electrons; Monitoring; Optical polarization; Photoelectricity; Physics; Radiative recombination; Resonance; Semiconductor device doping; Spontaneous emission; Temperature dependence;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Microelectronics Conference, 1996. IVMC'96., 9th International
Conference_Location
St. Petersburg
Print_ISBN
0-7803-3594-5
Type
conf
DOI
10.1109/IVMC.1996.601913
Filename
601913
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