DocumentCode :
3297222
Title :
Interconnect Pitch for New Generation: Evolution due to Inductive Impact
Author :
Lorival, J.E. ; Deschacht, D. ; Quere, Y. ; Le Gouguec, Thierry ; Huret, F.
Author_Institution :
Lab. d´´Informatique de Robotique, Microelectronique de Montpellier
fYear :
2006
fDate :
9-12 May 2006
Firstpage :
193
Lastpage :
196
Abstract :
Constant evolution in integrated circuits technology has led to an increase of the switching speed of the digital chip. As a result, there is a growing interest in the inductance associated with signal lines. Inductive coupling effects on interconnects is an emerging concern in high performance digital integrated circuits. Since global wires run on less dense upper metal layers increase wires separation allows reducing the coupling capacitance influence. However, with new technologies, the inductive coupling is not negligible, and don´t decrease at the same rate than the capacitive one, leading to an increase of the pitch to maintain the signal integrity
Keywords :
coupled circuits; digital integrated circuits; wires; coupling capacitance; digital chip; high performance digital integrated circuits; inductive coupling effects; inductive impact; integrated circuits technology; interconnect pitch; metal layers; wires separation; Capacitance; Coupling circuits; Crosstalk; Inductance; Integrated circuit interconnections; Integrated circuit technology; Microelectronics; Very large scale integration; Voltage; Wires;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Signal Propagation on Interconnects, 2006. IEEE Workshop on
Conference_Location :
Berlin, Germany
Print_ISBN :
1-4244-0455-x
Electronic_ISBN :
1-4244-0455-x
Type :
conf
DOI :
10.1109/SPI.2006.289218
Filename :
4069453
Link To Document :
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