• DocumentCode
    3297222
  • Title

    Interconnect Pitch for New Generation: Evolution due to Inductive Impact

  • Author

    Lorival, J.E. ; Deschacht, D. ; Quere, Y. ; Le Gouguec, Thierry ; Huret, F.

  • Author_Institution
    Lab. d´´Informatique de Robotique, Microelectronique de Montpellier
  • fYear
    2006
  • fDate
    9-12 May 2006
  • Firstpage
    193
  • Lastpage
    196
  • Abstract
    Constant evolution in integrated circuits technology has led to an increase of the switching speed of the digital chip. As a result, there is a growing interest in the inductance associated with signal lines. Inductive coupling effects on interconnects is an emerging concern in high performance digital integrated circuits. Since global wires run on less dense upper metal layers increase wires separation allows reducing the coupling capacitance influence. However, with new technologies, the inductive coupling is not negligible, and don´t decrease at the same rate than the capacitive one, leading to an increase of the pitch to maintain the signal integrity
  • Keywords
    coupled circuits; digital integrated circuits; wires; coupling capacitance; digital chip; high performance digital integrated circuits; inductive coupling effects; inductive impact; integrated circuits technology; interconnect pitch; metal layers; wires separation; Capacitance; Coupling circuits; Crosstalk; Inductance; Integrated circuit interconnections; Integrated circuit technology; Microelectronics; Very large scale integration; Voltage; Wires;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Signal Propagation on Interconnects, 2006. IEEE Workshop on
  • Conference_Location
    Berlin, Germany
  • Print_ISBN
    1-4244-0455-x
  • Electronic_ISBN
    1-4244-0455-x
  • Type

    conf

  • DOI
    10.1109/SPI.2006.289218
  • Filename
    4069453