DocumentCode :
32973
Title :
Numerical Study of Very Small Floating Islands
Author :
Watanabe, Hiromi ; Yao, Kai ; Lin, James
Author_Institution :
Nat. Chiao Tung Univ., Hsinchu, Taiwan
Volume :
61
Issue :
4
fYear :
2014
fDate :
Apr-14
Firstpage :
1145
Lastpage :
1152
Abstract :
The electrical property of very small floating island whose diameter is less than the de Broglie length is numerically investigated without fitting parameters. In general, it is difficult to well define the capacitance of very small floating islands. In this paper, instead of using the capacitance of islands, the kicking algorithm is applied for simulating the single-electron phenomena of spherical islands (the diameter: ø=0.6, 4, and 6 nm). As a result, the self-potentials of islands are successfully obtained within the precision equivalent to the movement of the sole electron with regard to given gate voltages. In addition, the transient simulation is demonstrated using the dwell time during which an electron is waiting for the next tunneling. The Coulomb blockade is successfully simulated without using the capacitance of very small floating islands. It is also found that trap-assisted tunneling is prohibited by Coulomb blockade at low electric field and can occur at high electric field.
Keywords :
Coulomb blockade; electric potential; single electron devices; tunnelling; Coulomb blockade; electrical property; island self-potentials; single-electron phenomena; spherical islands; transient simulation; trap-assisted tunneling; very small floating island; Capacitance; Electric potential; Electrodes; Logic gates; Mathematical model; Silicon; Tunneling; Capacitance coupling ratio; Coulomb blockade; device modeling; floating gate; floating island; silicon dot; single-electron phenomena; trap-assisted tunneling;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2306935
Filename :
6766666
Link To Document :
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