• DocumentCode
    3297380
  • Title

    Si-substrate Modeling toward Substrate-aware Interconnect Resistance and Inductance Extraction in SoC Design

  • Author

    Kanamoto, Toshiki ; Ikeda, Tatsuhiko ; Tsuchiya, Akira ; Onodera, Hidetoshi ; Hashimoto, Masanori

  • Author_Institution
    RENESAS Technol.
  • fYear
    2006
  • fDate
    9-12 May 2006
  • Firstpage
    227
  • Lastpage
    230
  • Abstract
    This paper proposes a simple yet sufficient Si-substrate modeling for interconnect resistance and inductance extraction. The proposed modeling expresses Si-substrate as four filaments in a filament-based extractor. Although the number of filaments is small, extracted loop inductances and resistances show accurate frequency dependence resulting from the proximity effect. We experimentally prove the accuracy using FEM (finite element method) based simulations of electromagnetic fields. We also show a method to determine optimal size of the four filaments. The proposed model realizes substrate-aware extraction in SoC design flow
  • Keywords
    electromagnetic fields; elemental semiconductors; finite element analysis; integrated circuit design; integrated circuit interconnections; integrated circuit modelling; silicon; system-on-chip; FEM; Si; Si-substrate modeling; SoC design; electromagnetic fields; filament-based extractor; finite element method; inductance extraction; proximity effect; substrate-aware interconnect resistance; Circuit simulation; Conductivity; Electrical resistance measurement; Frequency dependence; Frequency measurement; Inductance measurement; Integrated circuit interconnections; Proximity effect; Semiconductor device modeling; Skin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Signal Propagation on Interconnects, 2006. IEEE Workshop on
  • Conference_Location
    Berlin, Germany
  • Print_ISBN
    1-4244-0455-x
  • Electronic_ISBN
    1-4244-0455-x
  • Type

    conf

  • DOI
    10.1109/SPI.2006.289229
  • Filename
    4069464