DocumentCode :
3301471
Title :
Physical effect from etching parameters on the Bragg grating waveguide fabricated on porous silicon nanostructure
Author :
Radzi, Ahmad Afif Safwan Mohd ; Rusop, Mohamad ; Abdullah, Saifollah
Author_Institution :
NANO-SciTech Centre, Univ. Teknol. MARA (UiTM) Malaysia, Shah Alam, Malaysia
fYear :
2012
fDate :
5-7 Jan. 2012
Firstpage :
1
Lastpage :
2
Abstract :
Multilayer porous silicon has been investigated due to its optical properties which can behave such as Bragg mirror, optical microcavity and Fabry-Perot interferometer. The structure of the fabricated BGW is very much relying on certain parameters during the electrochemical etching process of the bulk crystalline silicon.
Keywords :
Bragg gratings; Fabry-Perot interferometers; electrochemical analysis; elemental semiconductors; etching; mirrors; nanophotonics; nanostructured materials; optical fabrication; optical waveguides; porous semiconductors; silicon; Bragg mirror; Fabry-Perot interferometer; Si; bulk crystalline silicon; electrochemical etching; etching parameters; fabricated Bragg grating waveguide structure; multilayer porous silicon nanostructure; optical microcavity; optical properties; Etching; Nonhomogeneous media; Optical device fabrication; Optical refraction; Refractive index; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Enabling Science and Nanotechnology (ESciNano), 2012 International Conference on
Conference_Location :
Johor Bahru
Print_ISBN :
978-1-4577-0799-5
Type :
conf
DOI :
10.1109/ESciNano.2012.6149708
Filename :
6149708
Link To Document :
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