Title :
Novel low-cost process for 0.1-/spl mu/m T-shaped gate of InGaP/InGaAs pseudomorphic HEMT
Author :
Sugiura, M. ; Morizuka, K.
Author_Institution :
Toshiba Corporation
Abstract :
T-gate HEMTs with deep submicron gate length are indispensable for realizing microwave and millimeter wave systems because of their superior performance in high-frequency operation and low noise characteristics [l]. In addition to high performance, recent growth in wireless applications such as broadband wireless communications and automotive radar systems have imposed strong cost reduction measures on these devices.
Keywords :
Etching; Gallium arsenide; HEMTs; Indium gallium arsenide; MODFETs; Numerical analysis; PHEMTs;
Conference_Titel :
GaAs IC Symposium, 1999. 21st Annual
Conference_Location :
Monterey, CA, USA
Print_ISBN :
0-7803-5585-7
DOI :
10.1109/GAAS.1999.803749