DocumentCode :
3301591
Title :
Novel low-cost process for 0.1-/spl mu/m T-shaped gate of InGaP/InGaAs pseudomorphic HEMT
Author :
Sugiura, M. ; Morizuka, K.
Author_Institution :
Toshiba Corporation
fYear :
1999
fDate :
17-20 Oct. 1999
Firstpage :
159
Lastpage :
162
Abstract :
T-gate HEMTs with deep submicron gate length are indispensable for realizing microwave and millimeter wave systems because of their superior performance in high-frequency operation and low noise characteristics [l]. In addition to high performance, recent growth in wireless applications such as broadband wireless communications and automotive radar systems have imposed strong cost reduction measures on these devices.
Keywords :
Etching; Gallium arsenide; HEMTs; Indium gallium arsenide; MODFETs; Numerical analysis; PHEMTs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
GaAs IC Symposium, 1999. 21st Annual
Conference_Location :
Monterey, CA, USA
ISSN :
1064-7775
Print_ISBN :
0-7803-5585-7
Type :
conf
DOI :
10.1109/GAAS.1999.803749
Filename :
803749
Link To Document :
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