Title :
Modeling and simulation of plasma processes
Author :
Graves, D.B. ; Surendra, M.
Author_Institution :
Dept. of Chem. Eng., California Univ., Berkeley, CA, USA
Abstract :
Some of the basic problems in modeling gas discharges between parallel plate electrodes are outlined. These problems are then illustrated with results from simulations of helium discharges in one spatial dimension.<>
Keywords :
discharges (electric); helium; plasma simulation; semiconductor process modelling; semiconductor technology; 1D simulations; He discharges; gas discharges; modeling; parallel plate electrodes; plasma processes; simulation; Discharges; Electrodes; Electrons; Helium; Plasma applications; Plasma chemistry; Plasma materials processing; Plasma simulation; Sputter etching; Surface cleaning;
Conference_Titel :
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location :
Washington, DC, USA
Print_ISBN :
0-7803-0243-5
DOI :
10.1109/IEDM.1991.235283
