Title :
Ultrathin metallic membranes to be used in tunable RF MEMS volume capacitors
Author :
Etxeberria, Jon A. ; Sancho, A. ; de la Fuente, P. ; Gracia, F.J. ; Cabezón, X.
Author_Institution :
Microelectron., CEIT, San Sebastian
fDate :
Oct. 30 2005-Nov. 3 2005
Abstract :
This paper presents a self-controlled reactive ion etching (RIE) bulk process to fabricate reliable and high precision suspended thin metallic membranes. The procedure includes a mechanism for the automatic stop of the RIE process, avoiding the stiction problem that appears when a wet etching is performed. These membranes can be used as movable plates in low DC controlled silicon microcapacitors for RF applications
Keywords :
capacitors; micromechanical devices; sputter etching; movable plates; reactive ion etching; silicon microcapacitors; tunable RF MEMS volume capacitors; ultrathin metallic membranes; wet etching; Biomembranes; Capacitors; Etching; Fabrication; Fingers; Micromachining; Micromechanical devices; Q factor; Silicon; Wafer bonding;
Conference_Titel :
Sensors, 2005 IEEE
Conference_Location :
Irvine, CA
Print_ISBN :
0-7803-9056-3
DOI :
10.1109/ICSENS.2005.1597732
