DocumentCode :
3303514
Title :
K-band GaN power HFET´s with 6.6 W/mm CW saturated output power density and 35% power added efficiency at 20 GHz
Author :
Micovic, Miro ; Moon, Jeong S. ; Kurdoghlian, Ara ; Hashimoto, Paul ; Wong, Danny ; McCray, Loren ; Hussain, Tahir ; Janke, Paul
Author_Institution :
Hughes Res. Labs., Malibu, CA, USA
fYear :
2001
fDate :
25-27 June 2001
Firstpage :
199
Lastpage :
200
Abstract :
AlGaN/GaN heterostructure field effect transistors (HFET´s) grown on SiC substrates are currently the most powerful three-terminal microwave solid state devices. While the power performance of these devices is well documented at X-band frequencies, there is growing interest in these devices at higher frequencies. In this study we characterize the power performance of GaN HFET´s at 20 GHz. Our results clearly show that GaN HFET´s have strong potential for power applications at K-band frequencies and beyond.
Keywords :
III-V semiconductors; gallium compounds; junction gate field effect transistors; microwave field effect transistors; power field effect transistors; wide band gap semiconductors; 20 GHz; 35 percent; CW saturated output power density; GaN; GaN power HFET; K-band; power added efficiency; three-terminal microwave solid-state device; Aluminum gallium nitride; Frequency; Gallium nitride; HEMTs; K-band; MODFETs; Microwave devices; Power generation; Silicon carbide; Solid state circuits;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2001
Conference_Location :
Notre Dame, IN, USA
Print_ISBN :
0-7803-7014-7
Type :
conf
DOI :
10.1109/DRC.2001.937930
Filename :
937930
Link To Document :
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