• DocumentCode
    3304152
  • Title

    A new approach for simulation of circuit degradation due to hot-electron damage in NMOSFETs

  • Author

    Quader, K.N. ; Li, C. ; Tu, R. ; Rosenbaum, E. ; Ko, P. ; Hu, C.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., California Univ., Berkeley, CA, USA
  • fYear
    1991
  • fDate
    8-11 Dec. 1991
  • Firstpage
    337
  • Lastpage
    340
  • Abstract
    The authors present a novel approach for modeling hot-electron-induced change in drain current for both forward and reverse modes of operation. The change in drain current, Delta I/sub D/, is implemented as an asymmetrical voltage-controlled current source. The authors first present the physical basis of the model and derive the analytical model equations. the implementation scheme for the analytical Delta I/sub D/ model in the BERT (Berkeley Reliability Tool) simulator and a detailed evaluation of the model as a function of different device and circuit parameters are also given. Simulation results of unidirectional and bidirectional circuits based on the new model are presented.<>
  • Keywords
    circuit analysis computing; hot carriers; insulated gate field effect transistors; semiconductor device models; BERT; Berkeley Reliability Tool; NMOSFETs; analytical model equations; asymmetrical voltage-controlled current source; bidirectional circuits; circuit degradation; circuit parameters; device parameters; drain current change; forward modes of operation; hot-electron damage; hot-electron-induced change in drain current; implementation scheme; modeling; n-MOSFETs; physical basis; reverse modes of operation; simulation; simulation results; unidirectional circuits; Analytical models; Artificial intelligence; Circuit simulation; Computational modeling; Degradation; Electrons; Interface states; MOSFET circuits; Virtual manufacturing; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0243-5
  • Type

    conf

  • DOI
    10.1109/IEDM.1991.235384
  • Filename
    235384