• DocumentCode
    3304586
  • Title

    Analysis of Drain Lag and Current Slump in GaN-Based HEMTs and MESFETs

  • Author

    Nakajima, A. ; Takayanagi, H. ; Itagaki, K. ; Horio, K.

  • Author_Institution
    Shibaura Inst. of Technol., Saitama
  • fYear
    2007
  • fDate
    July 30 2007-Aug. 2 2007
  • Firstpage
    193
  • Lastpage
    196
  • Abstract
    Two-dimensional transient analyses of AlGaN/GaN HEMTs are performed in which a deep donor and a deep acceptor are considered in a semi-insulating buffer layer. Quasi-pulsed I-V curves are derived from the transient characteristics. It is shown that the deep levels affect the results essentially in a similar way as for GaN MESFETs. It is shown that so-called current slump is more pronounced when the deep-acceptor density in the buffer layer is higher and when an off-state drain voltage is higher, because trapping effects become more significant. It is suggested that to minimize current slump in GaN-based FETs, an acceptor density in a semi-insulating GaN layer should be made low.
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; aluminium compounds; buffer layers; gallium compounds; high electron mobility transistors; transient analysis; wide band gap semiconductors; 2D transient analyses; AlGaN-GaN; AlGaN/GaN HEMT; GaN-based FET; GaN-based HEMT; MESFET; current slump analysis; deep donor; deep-acceptor density; drain lag analysis; quasi-pulsed I-V curves; semi-insulating GaN layer; semi-insulating buffer layer; trapping effects; Aluminum gallium nitride; Buffer layers; Current slump; FETs; Gallium nitride; HEMTs; MESFETs; MODFETs; Transient analysis; Voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Signals, Systems and Electronics, 2007. ISSSE '07. International Symposium on
  • Conference_Location
    Montreal, Que.
  • Print_ISBN
    1-4244-1448-2
  • Electronic_ISBN
    1-4244-1449-0
  • Type

    conf

  • DOI
    10.1109/ISSSE.2007.4294446
  • Filename
    4294446