DocumentCode :
3304824
Title :
High-performance microwave passive components on silicon substrate
Author :
Chen, Kevin J. ; Huo, Xiao ; Leung, Lydia L W ; Chan, Philip C.H.
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ. of Sci. & Technol., China
fYear :
2002
fDate :
17-19 Aug. 2002
Firstpage :
263
Lastpage :
266
Abstract :
High-Performance microwave passive components are demonstrated on standard silicon substrate incorporating a low-k Benzocyclobutene (BCB) layer. Metal ohmic loss and substrate coupling loss, the two major factors that degrade the on-chip passive components are suppressed by the employment of electroplated copper and the low-k BCB layer, respectively. Spiral inductors exhibit Q-factor as high as 25 at 2 GHz. A low-loss, low-pass microstrip transmission line based microwave filter has been fabricated. The filter has a cut-off frequency at 10 GHz with an insertion loss of -1.1 dB. The fabrication process is low-cost and low-temperature, making it suitable for post-IC process for high performance RFIC´s and MMIC´s.
Keywords :
Q-factor; elemental semiconductors; inductors; low-pass filters; microstrip filters; microwave filters; silicon; -1.1 dB; 10 GHz; 2 GHz; Cu; MMIC; Q-factor; RFIC; Si; cutoff frequency; electroplated copper; insertion loss; low-k BCB layer; low-loss low-pass microstrip transmission line; low-temperature fabrication process; metal ohmic loss; microwave filter; microwave passive component; silicon substrate; spiral inductor; substrate coupling loss; Copper; Couplings; Degradation; Employment; Inductors; Microstrip filters; Microwave filters; Q factor; Silicon; Spirals;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter Wave Technology, 2002. Proceedings. ICMMT 2002. 2002 3rd International Conference on
Print_ISBN :
0-7803-7486-X
Type :
conf
DOI :
10.1109/ICMMT.2002.1187686
Filename :
1187686
Link To Document :
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