DocumentCode :
3305032
Title :
On-chip picosecond time-domain measurement of silicon bipolar transistor characteristics using integrated GaAs photoconductive devices
Author :
Anderson, G.D. ; Dutton, R.W. ; Morse, J.D. ; Mariella, R.P., Jr.
Author_Institution :
Integrated Circuits Lab., Stanford Univ., CA, USA
fYear :
1991
fDate :
8-11 Dec. 1991
Firstpage :
37
Lastpage :
40
Abstract :
Picosecond time-domain measurements of silicon bipolar transistors have been performed using thin-film GaAs photoconductive switches integrated on-chip. Low temperature MBE (molecular beam epitaxy) growth techniques were used to fabricate the GaAs-on-silicon structures. These devices produced 5 ps full width at half maximum (FWHM) electrical pulses when excited by high-speed laser pulses. Results of using these optical switches to characterize 4 GHz bipolar transistors are presented. It is noted that the technique used here allows local testing of high-speed devices with a minimum for on-chip parasitics. Precise control of sampling using variable-length optical paths (off-chip) are not only convenient but isolate the device from the measurement set-up.<>
Keywords :
III-V semiconductors; bipolar transistors; gallium arsenide; photoconducting devices; semiconductor device testing; semiconductor switches; silicon; 4 GHz; GaAs-Si; bipolar transistor characteristics; electrical pulses; high-speed devices; high-speed laser pulses; integrated GaAs photoconductive devices; local testing; low temperature MBE growth; molecular beam epitaxy; onchip picosecond measurements; thin-film GaAs photoconductive switches; time-domain measurement; variable-length optical paths; Bipolar transistors; Molecular beam epitaxial growth; Optical pulses; Optical switches; Performance evaluation; Semiconductor thin films; Silicon; Space vector pulse width modulation; Thin film transistors; Time domain analysis;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0243-5
Type :
conf
DOI :
10.1109/IEDM.1991.235429
Filename :
235429
Link To Document :
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