DocumentCode :
3305981
Title :
The physical mechanisms governing DC breakdown in GaAs MESFETs
Author :
Ashworth, J.M.
Author_Institution :
Siemens AG, Munich, Germany
fYear :
1991
fDate :
8-11 Dec. 1991
Firstpage :
135
Lastpage :
137
Abstract :
The combined processes of tunneling and impact ionization are identified as the physical mechanisms governing breakdown in GaAs MESFETs under pinch-off bias conditions. It is proposed that electrons tunnel through the Schottky barrier and then are accelerated towards the drain contact causing impact ionization in the high field region about the drain-sided gate edge. A new, simple model to describe the quantum-mechanical tunneling of the Schottky barrier is presented. This model has been incorporated into the fully self-consistent, two-dimensional device simulator MINIMOS. First results show excellent qualitative agreement with experimental data.<>
Keywords :
III-V semiconductors; Schottky effect; Schottky gate field effect transistors; electric breakdown of solids; gallium arsenide; impact ionisation; semiconductor device models; tunnelling; DC breakdown; GaAs; MESFETs; MINIMOS; Schottky barrier; drain-sided gate edge; experimental data; high field region; impact ionization; physical mechanisms; pinch-off bias conditions; quantum-mechanical tunneling; semiconductors; tunneling; two-dimensional device simulator; Electric breakdown; Electrons; FETs; Gallium arsenide; Impact ionization; MESFETs; Quantum mechanics; Schottky barriers; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
Conference_Location :
Washington, DC, USA
ISSN :
0163-1918
Print_ISBN :
0-7803-0243-5
Type :
conf
DOI :
10.1109/IEDM.1991.235482
Filename :
235482
Link To Document :
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