• DocumentCode
    3306059
  • Title

    Computation of drain and substrate currents in ultra-short-channel nMOSFETs using the hydrodynamic model

  • Author

    Rahmat, K. ; White, J. ; Antoniadis, D.A.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA
  • fYear
    1991
  • fDate
    8-11 Dec. 1991
  • Firstpage
    115
  • Lastpage
    118
  • Abstract
    An attempt was made to develop a robust and efficient numerical solution of the hydrodynamic model which solves the energy balance equation and to compare predictions of this model, using one set of parameters, with experimental nMOSFET characteristics for a range of channel lengths down to ultrashort channels. The substrate current was calculated by direct integration of the energy distribution function to obtain the number of high-energy electrons. It is demonstrated that the hydrodynamic model can be used successfully to simulate silicon MOSFETs with channel lengths as short as 0.16 mu m. Equally important is the fact that one set of parameters is used to simulate devices with channel lengths varying from 0.90 mu m down to 0.16 mu m and all the parameter values used are physically justifiable. The importance of using a stable discretization method in the energy balance equation to avoid spurious numerical results is also shown.<>
  • Keywords
    hot carriers; insulated gate field effect transistors; semiconductor device models; 0.9 to 0.16 micron; Si; channel lengths; direct integration; drain current; energy balance equation; hydrodynamic model; modeling; number of high-energy electrons; numerical solution; one set of parameters; physically justifiable parameters; stable discretization method; substrate current; ultra short channel nMOSFET; ultrashort channels; Computational modeling; Electrons; FETs; Hydrodynamics; MOSFETs; Nonlinear equations; Poisson equations; Predictive models; Temperature; Thermal conductivity;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 1991. IEDM '91. Technical Digest., International
  • Conference_Location
    Washington, DC, USA
  • ISSN
    0163-1918
  • Print_ISBN
    0-7803-0243-5
  • Type

    conf

  • DOI
    10.1109/IEDM.1991.235487
  • Filename
    235487