Title :
Novel Process Of SiO/sub 2//Si Selective Etching Using New Gas System Against Global Warning
Author :
Hori, M. ; Fujita, K. ; Ito, M. ; Goto, T.
Author_Institution :
Nagoya University
Keywords :
Etching; Feeds; Gas lasers; Gases; Mass spectroscopy; Plasma applications; Plasma density; Plasma measurements; Plasma properties; Plasma sources;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729914
