DocumentCode
330608
Title
Spatial And Temporal Radical Distribution In Inductively Coupled Plasma For SiO/sub 2/ Etching
Author
Hayashi, S. ; Yamanaka, M. ; Kubota, M. ; Ogura, M.
Author_Institution
Matsushita Electronics Corporation
fYear
1998
fDate
13-16 July 1998
Firstpage
10
Lastpage
11
Keywords
Etching; Fluorescence; Optical coupling; Plasma applications; Plasma density; Plasma materials processing; Plasma measurements; Reflection; Spatial resolution; Ultra large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.729916
Filename
729916
Link To Document