DocumentCode :
330609
Title :
Dissociation Mechanism Of C4F8 In Parallel-Plate-Type RIE
Author :
Hayashi, H. ; Morishita, S. ; Tatsumi, T. ; Hikosaka, Y. ; Noda, S. ; Nakagawa, H. ; Kobayashi, S. ; Inoue, M. ; Hoshino, T.
Author_Institution :
Plasma Technology Laboratory, Association of Super-Advanced Electronics Technologies
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
12
Lastpage :
13
Keywords :
Argon; Density measurement; Electrons; Plasma density;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729917
Filename :
729917
Link To Document :
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