Title :
Al Etch And After-Corrosion Characteristics In A M = 0 Helicon Wave Plasma Etcher
Author :
Ha, Jae Hyoun ; Yim, M.H. ; Kim, Jonghoon J.
Author_Institution :
Central Research Laboratory, LG Semicon
Keywords :
Aluminum; Cleaning; Corrosion; Etching; Plasma applications; Plasma measurements; Plasma properties; Plasma sources; Plasma waves; Strips;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729919
