Title :
X-Ray Lithography: Recent Progress And Future Developments
Author_Institution :
LSI Basic Research Laboratory, Silicon Systems Research Labs., NEC Corp.
Keywords :
Amorphous magnetic materials; Costs; Electron beams; Fabrication; Laboratories; Large scale integration; National electric code; Silicon; Throughput; X-ray lithography;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729920
