• DocumentCode
    330611
  • Title

    X-Ray Lithography: Recent Progress And Future Developments

  • Author

    Suzuki, K.

  • Author_Institution
    LSI Basic Research Laboratory, Silicon Systems Research Labs., NEC Corp.
  • fYear
    1998
  • fDate
    13-16 July 1998
  • Firstpage
    16
  • Lastpage
    16
  • Keywords
    Amorphous magnetic materials; Costs; Electron beams; Fabrication; Laboratories; Large scale integration; National electric code; Silicon; Throughput; X-ray lithography;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology Conference, 1998 International
  • Conference_Location
    Kyoungju, South Korea
  • Print_ISBN
    4-930813-83-2
  • Type

    conf

  • DOI
    10.1109/IMNC.1998.729920
  • Filename
    729920
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=330611