Scalpel

SCALPEL (Scattering with Angular Limitation Projection Electron beam Lithography) combines the high resolution and wide process latitude inherent in electron beam lithography with the throughput of a projection system. This approach has the potential to satisfy the lithographic requirements for many IC generations, down to the minimum feature sizes contemplated in the SIA roadmap. We believe that with solid industry support and resources, SCALPEL can be introduced in the 130 nm generation as a replacement for 193 nm lithography for critical levels with reduced cost. SCALPEL masks are expected to be considerably lower cost than optical masks which will require OPC and phase shift for the 130 nm generation.