DocumentCode

330629

Title

Mask Patterning Challenges Beyond 150 nm

Author

Gesley, M.

Author_Institution

Etec Systems, Inc.

fYear

1998

fDate

13-16 July 1998

Firstpage

49

Lastpage

49

Keywords

Bandwidth; Channel capacity; Heating; Lithography; Manufacturing processes; Product development; Semiconductor device manufacture; Shape; Throughput; Writing;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729954

Filename

729954