Title :
Monte-Carlo Based Optical Proximity Correction For The Half-Tone Phase Shift Mask
Author :
Oh, Yong-Ho ; Lee, Jai-Cheol ; Lim, Sungwoo
Author_Institution :
Wonkwang University
Keywords :
Degradation; Design automation; Image quality; Manufacturing; Physics; Testing; Very large scale integration;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729964
