Title :
OPC Methodology To Overcome Mask Error Effect On Below 0.25 um Lithography Generation
Author :
Kim, Keeho ; Madhavan, Sriram ; Lilygren, John
Author_Institution :
Cypress Semiconductor
Keywords :
Character generation; Error correction; Inspection; Leakage current; Lithography; Manufacturing; Predictive models; Research and development; Testing; Writing;
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
DOI :
10.1109/IMNC.1998.729965
