DocumentCode
330637
Title
ArF Excimer Laser Lithography
Author
Sasago, M.
Author_Institution
Association of Super-Advanced Electronics Technologies (ASET)
fYear
1998
fDate
13-16 July 1998
Firstpage
66
Lastpage
66
Keywords
Costs; Electronics industry; Industrial electronics; Integrated optics; Lithography; Mass production; Optical attenuators; Optical devices; Resists; Semiconductor lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location
Kyoungju, South Korea
Print_ISBN
4-930813-83-2
Type
conf
DOI
10.1109/IMNC.1998.729967
Filename
729967
Link To Document