DocumentCode

330640

Title

A New Fabrication Process Of Field Emitter Arrays Using Silicon Delamination By Hydrogen Ion Implantation

Author

Sasaguri, Daisuke ; Asano, Tanemasa

Author_Institution

Kyushu Institute of Technology

fYear

1998

fDate

13-16 July 1998

Firstpage

71

Lastpage

72

Keywords

Delamination; Electrodes; Fabrication; Field emitter arrays; Hydrogen; Implants; Insulation; Ion implantation; Silicon; Wafer bonding;

fLanguage

English

Publisher

ieee

Conference_Titel

Microprocesses and Nanotechnology Conference, 1998 International

Conference_Location

Kyoungju, South Korea

Print_ISBN

4-930813-83-2

Type

conf

DOI

10.1109/IMNC.1998.729970

Filename

729970