DocumentCode :
330640
Title :
A New Fabrication Process Of Field Emitter Arrays Using Silicon Delamination By Hydrogen Ion Implantation
Author :
Sasaguri, Daisuke ; Asano, Tanemasa
Author_Institution :
Kyushu Institute of Technology
fYear :
1998
fDate :
13-16 July 1998
Firstpage :
71
Lastpage :
72
Keywords :
Delamination; Electrodes; Fabrication; Field emitter arrays; Hydrogen; Implants; Insulation; Ion implantation; Silicon; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microprocesses and Nanotechnology Conference, 1998 International
Conference_Location :
Kyoungju, South Korea
Print_ISBN :
4-930813-83-2
Type :
conf
DOI :
10.1109/IMNC.1998.729970
Filename :
729970
Link To Document :
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